2017 IEEE Honors: IEEE Robert N. Noyce Medal - Henry I. Smith

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#IEEE #honors #ceremony #awards #recognition #2017 #San Francisco #engineering #inventor #inventions #lithography #nanolithography #nanopatterning #shortwavelength #exposure systems #attenuated phaseshift masks #semiconductors

Henry I. Smith, an IEEE Life Fellow and member of the U.S. National Academy of Engineering, is honored for contributions to lithography and nanopatterning for experimental devices in short-wavelength exposure systems and attenuated phase-shift masks. Smith’s work has been critical to the semiconductor industry, and has contributed five decades of inventions that were “well before their time”. In lithography, Smith’s inventions have inspired development of technology that is now the latest state-of-the-art nanolithography for high-performance chips.

View the official program link for more details http://online.qmags.com/IEEEAwards17?pg=9&mode=2#pg15&mode2

Read more about the IEEE Honors Ceremony at https://www.ieee.org/about/awards/honors_ceremony.html

Henry I. Smith, an IEEE Life Fellow and member of the U.S. National Academy of Engineering, is honored for contributions to lithography and nanopatterning for experimental devices in short-wavelength exposure systems and attenuated phase-shift masks. Smith’s work has been critical to the semiconductor industry, and has contributed five decades of inventions that were “well before their time”.

 

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